クレステックは徹底したマーケットイン志向の電子線描写技術を専門としたナノテク企業です。
●Major examples of EB NANO FABRICATION SERVICE 
 
■3D Pattern Writing Method Blazed Grating

3D Pattern Writing Method Blazed Grating 3D Pattern Writing Method Blazed Grating Blazed Grating by changing dose amount
 ■3D Concentric Circular Pattern

3D Concentric Circular Pattern 3D Concentric Circular Pattern 3D Concentric Circular Pattern Smooth surface of blazed Grating.
 ■2D Photonic Crystals

フォトニック結晶 2D Photonic Crystals フォトニック結晶 2D Photonic Crystals
Dot patterns by spot scan method.

■Hexagonal Grating

Hexagonal Grating Each dot size is 60nmφ
■Computer Generated Hologram

Computer Generated Hologram Computer Generated Hologram Magnification : × 170(R)
Magnification : × 85(L)

Hologram Pattern by Raster scan method. The pixel size is 1.25um.
For customers who try new applications, CRESTEC will provide solutions. Please call us for more information.