クレステックは徹底したマーケットイン志向の電子線描写技術を専門としたナノテク企業です。

EB LITHOGRAPHY SYSTEM CABL-9000C series

電子線描画装置
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State of Art!Newest line up of CRESTEC's point beam EB lithography system.
Easy to use, CE marking, Windows OS,Multi user management GDSII DXF file conversion

EB MASTERING SYSTEM  CEBR series

 
 

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EB mastering system with X & theta stage for mastering of next generation DVD & HDD(bit patterned media)

Surface Emission Ballistic  EB Exposure System

 
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This Surface Emission Ballistic  EB Exposure System is expected as post 45nm node solution.