クレステックは徹底したマーケットイン志向の電子線描写技術を専門としたナノテク企業です。
CRESTEC, EB Lithography manufacturer

PRODUCTS

 
 
 
 
 

 

            

INFORMATION

2010/9/19-22
We will exhibit at MNE 2010 in Genova, Italy. Please visit our booth!
2010/9/29-10/1
We will exhibit at InterOpto 2010 in Yokohama, Japan. Please visit our booth!
One of our CABL-9000C series users, UNIVERSITY POLITECNICA DE MADRID presented the article "Stochastic nature of the domain wall depinning in permalloy magnetic nanowires" on APS journals web site on 31 August refering to our system.
An article of "Fabrication of Binary Diffractive Lens for Controlling the Luminous Intensity Distribution of LED Light" wiritten by Dr. Atushi Motogaito, Division of Electrical and Electronic Engineering, Graduate School of Engineering, Mie University, was posted on OPTICAL REVIEW Vol. 16.
One of our CABL-9000C series users, the group of BIONEM of university Magna Gracia of Catanzaro, Italy & CalMED s.r.l  presented an article of "3D self-similar chain nano lens fabrication and their use in single molecule detaction" at  EIPBN2009(USA).
An article of "high performance and Low 1/f noise Tri-gate MOSFETs" written by Dr. Cheng of Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on the Microelectronic Engineering 86 (2009).
An article of "Complementary Metal-Oxide-Silicon Field-Effect-Transistors Featuring Atomically Flat Gate Insulator Film/Silicon Interface" written by Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on JJAP 48 (2009) 04C048.
Our articles about CEBR and CSEL are posted on the Journal of Vacuum Science and Technology.

2010/7/28-30
We exhibited at Micromachine/MEMS show in Tokyo, Japan.
2010/7/26-30
At IVNC 2010 (23rd International Vacuum Nanoelectronics Conference), Palo Alto, California, we made an oral presentation about "Surface Emission Parallel EB Lithography".
2010/6/1-4
We exhibited at EIPBN 2010 in Anchorage, Alaska.
2010/2/17-19
We exhibited at nano tech 2010 in Tokyo.
2009/12/2-4
We exhibited at Semicon Japan 2009.
2009/09/28-10/1
We exhibited at MNE2009 in Ghent, Belgium.
2009/02/22-27
We presented an article about CSEL at
SPIE Advanced Lithography Conference(San Jose, USA) on 26th, Feb.
February, 2008
The CABL-9510C was installed at the University of California, Berkeley, US.
November, 2007
The CABL-9510C was installed at the University of Cambridge, UK.
EIPBN PRESS RELEASE 2007

CONTACT

 

 Email us for more information: sales@crestec8.co.jp