クレステックは徹底したマーケットイン志向の電子線描画技術を専門としたナノテク企業です。
CRESTEC, EB Lithography manufacturer

PRODUCTS

 
 
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NEW CABL-UH series
  We are pleased to release our new product, the CABL-UH series.
This model has realized a world highest acceleration voltage 130keV!
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CABL-9000C series
CABL-9000C series is stable, robust, high-resolution, dedicated EB Lithography system which has been installed at major nano-micro research centers world wide.
 

 

        

 

INFORMATION

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A User's voice from City University of Hong Kong

NEW!

June.26 - 30,  2016
We will exhibit at CSW2016 held at
Toyama(Toyama, JAPAN). We are looking forward to seeing you at the show!

NEW!

May.31,2016

A Crestec CABL-8000TF SERIES user,
Associate Professor Dr. Satoshi Takei of Toyama Prefectural University, has published a paper in Applied Physics Express entitled "Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography"

 

June, 2015
A Crestec CABL-8000C user, Associate Professor Dr. Atushi Motogaito of Mie University, has contributed an article to Springer.
http://www.springer.com/home?SGWID=0-0-1003-0-0&aqId=2848719&download=1&checkval=bef70673b7fd2d1720135675c78e40b5
A Crestec CABL-8000C user, Associate Professor Dr. Atushi Motogaito of Mie University, has contributed an article to Optics Photonics Journal. There is a mentioning about Crestec CABL-8000C on Page 2. Please visit the site and download the article.http://www.scirp.org/journal/PaperInformation.aspx?PaperID=28942
(Downloadable until end of June, 2015)
UNIVERSITY POLITECHNICA DE MADRID, one of our CABLE-9000C serieses users presented the article "Stochastic nature of the domain wall depinning permalloy magnetic nanorires" on APS journals web site on 31 August with reference to our system.
An article of "Fabrication of Binary Diffractive Lens for Controlling the Luminous Intensity Distribution of LED Light" wiritten by Dr. Atushi Motogaito, Division of Electrical and Electronic Engineering, Graduate School of Engineering, Mie University, was posted on OPTICAL REVIEW Vol. 16.
One of our CABL-9000C series users, the group of BIONEM of university Magna Gracia of Catanzaro, Italy & CalMED s.r.l  presented an article of "3D self-similar chain nano lens fabrication and their use in single molecule detection" at  EIPBN2009(USA).
The article of "high performance and Low 1/f noise Tri-gate MOSFETs" written by Dr. Cheng of Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on the Microelectronic Engineering 86 (2009).
The article of "Complementary Metal-Oxide-Silicon Field-Effect-Transistors Featuring Atomically Flat Gate Insulator Film/Silicon Interface" written by Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on JJAP 48 (2009) 04C048.
Our articles about CEBR (Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media) and CSEL (Sub-50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter) are posted on the Journal of Vacuum Science and Technology. (Subscriber registration is required to download PDF files.)

2010/7/26-30
At IVNC 2010 (23rd International Vacuum Nanoelectronics Conference), Palo Alto, California, we made an oral presentation about "Surface Emission Parallel EB Lithography".

CONTACT

 

Email us for more information: sales@crestec8.co.jp