We are pleased to release our new product, the CABL-UH series. This model has realized a world highest acceleration voltage 130keV!
CABL-9000Cseries
CABL-9000C series is stable, robust, high-resolution, dedicated EB Lithography system which has been installed at major nano-micro research centers world wide.
2013/5/28-31 We will exhibit at EIPBN 2013 at Nashville, Tenessee. Please come to visit our booth!
Crestec CABL-8000C user, Associate Professor Dr. Atushi Motogaito of Mie University, has contributed an article to Optics Photonics Journal. There is a mentioning about Crestec CABL-8000C on Page 2. Please visit the site and download the article.http://www.scirp.org/journal/PaperInformation.aspx?PaperID=28942
UNIVERSITY POLITECHNICA DE MADRID, one of our CABLE-9000C serieses users presented the article "Stochastic nature of the domain wall depinning permalloy magnetic nanorires" on APS journals web site on 31 August with reference to our system.
One of our CABL-9000C series users, the group of BIONEM of university Magna Gracia of Catanzaro, Italy & CalMED s.r.l presented an article of "3D self-similar chain nano lens fabrication and their use in single molecule detection" at EIPBN2009(USA).
The article of "high performance and Low 1/f noise Tri-gate MOSFETs"written by Dr. Cheng of Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on the Microelectronic Engineering 86 (2009).
The article of "Complementary Metal-Oxide-Silicon Field-Effect-Transistors Featuring Atomically Flat Gate Insulator Film/Silicon Interface" written by Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on JJAP 48 (2009) 04C048.
Our articles about CEBR (Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media) and CSEL (Sub-50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter) are posted on the Journal of Vacuum Science and Technology. (Subscriber registration is required to download PDF files.)
2013/1/30-2/1 We exhibited at nano tech 2013 Japan at Tokyo, Japan. Thank you for visiting us.
2012/12/5-7 We exhibited at SEMICON Japan 2012 held at Makuhari, Japan. Thank you for visiting us.
2012/10/30-11/2 We exhibited at MNC 2012 at Kobe, Japan. Thank you for visiting our booth!
2012/9/25-27 We exhibited at Interopto 2012 at Yokohama, Japan. Thank you for visiting our booth!
2012/9/16-20 We exhibited at MNE 2012 at Toulouse, France. Thank you for visiting our booth!
2012/5/29-6/1 We exhibited at EIPBN at Waikoloa, Hawaii. Thank you for visiting our booth!
2012/5/8-10 We exhibited at CLEO held at San Jose, CA. Thank you for visiting our booth!
2012/2/15-17 We exhibited at nano tech 2012 at Tokyo. Thank you for visiting our booth!
2011/12/7-9 We exhibited at SEMICON Japan at Tokyo. Thank you for visiting our booth!
2011/9/11-23 We exhibited at mne 2011 at Berlin. Thank you for visiting our booth!
2011/5/31-6/2 We exhibited at EIPBN 2011 at Las Vegas, US and performed an poster presentation of "Surface electron emission lithography with electron source of high emission efficiency".
2011/2/16-18 We exhibited at nano tech 2011 show in Japan. Thank you for visiting our booth!
2010/7/26-30 At IVNC 2010 (23rd International Vacuum Nanoelectronics Conference), Palo Alto, California, we made an oral presentation about "Surface Emission Parallel EB Lithography".
