クレステックは徹底したマーケットイン志向の電子線描画技術を専門としたナノテク企業です

OUR BUSINESS

Crestec Corporation has established in Tokyo 1995. We delivered EB Lithography System more than 50 customers all of the world. We provide EB foundry service too. We can make fine controlled pitch L/S patterns for DFB-LD. CABL-9000C model is the best seller of DFB-LD market.

EB Lithography System

CABL-UH(130kV)series

CABL-UH

There is less forwardscatter of EB resist due to higher acceleration voltage.
CABL-UH model has more accuracy less than 10nm.

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CABL-9000C(50kV)series

CABL-9000C

It is the best model for production of DFB-Laser diode for optical communication devices. We realize high resolution and high throughput with 50kV.

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CUSTOMER LIST

We provide EB Lithography System to Universities and
research institutes for R&D purpose,
and private companies for production use too.
 

See our list
2017/09/06
【Exhibition】ECOC 2017 Booth#568
【Show name】 ECOC 2017 - European Conference on Optical Communication 【Date & Period】Sep. 18-20 【Location】 The Swedish Exhibition & Congress Centre (Gothenburg, Sweden) 【Booth#】568 We are looking forward to seeing you!!
2017/04/27
【Paper】Dr. Satoshi Takei (Toyama Prefectural University)
Our CABL-8000TF SERIES User, Dr. Satoshi Takei's paper was published in AIP Advances (online). “High-resolution nanopatterning of biodegradable polylactide by thermal nanoimprint lithography using gas permeable mold” Satoshi Takei, and Makoto Hanabata AIP Advances 7, 035110 (2017); http://doi.org/10.1063/1.4978448

Please feel free to contact us.