クレステックは徹底したマーケットイン志向の電子線描写技術を専門としたナノテク企業です。
CRESTEC, EB Lithography manufacturer

PRODUCTS

 
 
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NEW CABL-UH series
  We are pleased to release our new product, the CABL-UH series.
This model has realized a world highest acceleration voltage 130keV!
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CABL-9000C series
CABL-9000C series is stable, robust, high-resolution, dedicated EB Lithography system which has been installed at major nano-micro research centers world wide.
 

 

        

 

INFORMATION

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A User's voice from City University of Hong Kong

15-17 Oct., 2014
We will exhibit at InterOpto 2014 at Pacific Yokohama. We are looking forward to seeing you at the show!
Crestec CABL-8000C user, Associate Professor Dr. Atushi Motogaito of Mie University, has contributed an article to Optics Photonics Journal. There is a mentioning about Crestec CABL-8000C on Page 2. Please visit the site and download the article.http://www.scirp.org/journal/PaperInformation.aspx?PaperID=28942
UNIVERSITY POLITECHNICA DE MADRID, one of our CABLE-9000C serieses users presented the article "Stochastic nature of the domain wall depinning permalloy magnetic nanorires" on APS journals web site on 31 August with reference to our system.
An article of "Fabrication of Binary Diffractive Lens for Controlling the Luminous Intensity Distribution of LED Light" wiritten by Dr. Atushi Motogaito, Division of Electrical and Electronic Engineering, Graduate School of Engineering, Mie University, was posted on OPTICAL REVIEW Vol. 16.
One of our CABL-9000C series users, the group of BIONEM of university Magna Gracia of Catanzaro, Italy & CalMED s.r.l  presented an article of "3D self-similar chain nano lens fabrication and their use in single molecule detection" at  EIPBN2009(USA).
The article of "high performance and Low 1/f noise Tri-gate MOSFETs" written by Dr. Cheng of Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on the Microelectronic Engineering 86 (2009).
The article of "Complementary Metal-Oxide-Silicon Field-Effect-Transistors Featuring Atomically Flat Gate Insulator Film/Silicon Interface" written by Ohmi Lab of Tohoku Univ. who is using the CABL-9520C is being posted on JJAP 48 (2009) 04C048.
Our articles about CEBR (Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media) and CSEL (Sub-50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter) are posted on the Journal of Vacuum Science and Technology. (Subscriber registration is required to download PDF files.)

29-31 Jan., 2014
We exhibited at nano tech 2014 at Tokyo Big site. Thank you for visiting our booth!
4-6 Dec., 2013
We exhibited at SEMICON JAPAN 2013. Thank you for visiting us!
16-18 Oct., 2013
We exhibited at InterOpto 2013 at Yokohama, Japan. Thank you for visiting us!
16-19 Sep., 2013
We exhibited at MNE2013 London. Thank you for visiting our booth!
2013/7/1-4
We exhibited at CLEO-PR & OECC/PS 2013 at Kyoto, Japan. Thank you for visiting our booth!
2013/5/28-31
We exhibited at EIPBN 2013 at Nashville, Tenessee. Thank you for visiting us!
2010/7/26-30
At IVNC 2010 (23rd International Vacuum Nanoelectronics Conference), Palo Alto, California, we made an oral presentation about "Surface Emission Parallel EB Lithography".

CONTACT

 

Email us for more information: sales@crestec8.co.jp