クレステックは徹底したマーケットイン志向の電子線描画技術を専門としたナノテク企業です

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Electron Beam Lithography System

Products

CABL-UH(130kV)series

CABL-UH

CABL-UH is higher acceleration voltage model. You can select 90kV, 110kV or 130kV

Beam diameter: <1.6 nmΦ
Minimum line width: 7 nm (at 130kV)
Accerelation Voltage: 130 kV, 110 kV or 90 kV
Stage size: 8 inch wafer

CABL-9000C (50kV) series

CABL-9000C

It is the best model for production of DFB-Laser diode for optical communication devices.

Beam diameter: < 2 nmΦ
Minimum line width: 10 nm
Accerelation voltage: 50kV, 30kV
Stage size: 4 inch, 6 inch ,8 inch wafer

Foundry Service

受託加工サービス

Crestec Corporation provides foundry service of EB lithography. We can expose fine grating patterns for DFB-LD production, and also any kind of R&D patterns. We have much experiences of EB lithography more than 20 years. Please feel free to contact us with your preferred pattern layout.

Please feel free to contact us